Thin Gold Films Sputter Deposition and Optical Characterization

Tik Sun

Date of Award

2005

Document Type

Thesis

Degree Name

Bachelors

Department

Natural Sciences

First Advisor

Sendova, Mariana

Keywords

Sputter Deposition, Thin Gold Films, Optical Characterization

Area of Concentration

Physics

Abstract

Sputter deposition is used to print integrated circuits in microelectronic devices. Gold films, due to their high chemical inertness and low resistance, are widely used as the material for circuits in microelectronics and micro bio-sensors. The properties of the thin gold film are directly affected by the technological parameters such as pressure in the deposition chamber, input current, geometrical configuration, target distance, and time of deposition. In this study, we tried to relate the optical properties of the deposited films to the sputtering conditions. Film thickness and cluster size were estimated from the optical extinction spectra in the UV visible range. Some of the films were thermally annealed and the change of the cluster size was compared to the as-deposited (without modification) film. The cluster size modification as a result of the thermal annealing was confirmed from the atomic force microscope images.

Rights

This bibliographic record is available under the Creative Commons CC0 public domain dedication. The New College of Florida, as creator of this bibliographic record, has waived all rights to it worldwide under copyright law, including all related and neighboring rights, to the extent allowed by law.

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